Al<inf>2</inf>O<inf>3</inf>/ZrO<inf>2</inf>/Al<inf>2</inf>O<inf>3</inf> high-k dielectric stacks on Germanium substrates grown by Atomic Layer Deposition at high and low temperatures

Publikation: Beitrag in Buch oder Tagungsband › Vortrag mit Beitrag in Tagungsband › Begutachtung

Research Field

@inproceedings{82f67c5018e046edb8887c7472f0fd36,

title = "Al2O3/ZrO2/Al2O3 high-k dielectric stacks on Germanium substrates grown by Atomic Layer Deposition at high and low temperatures",

author = "O. Bethge and S. Abermann and C. Henkel and E. Bertagnolli",

year = "2009",

doi = "10.1149/1.2981618",

language = "English",

booktitle = "ECS Transactions",

}

TY - GEN

T1 - Al2O3/ZrO2/Al2O3 high-k dielectric stacks on Germanium substrates grown by Atomic Layer Deposition at high and low temperatures

AU - Bethge, O.

AU - Abermann, S.

AU - Henkel, C.

AU - Bertagnolli, E.

PY - 2009

Y1 - 2009

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-63149180637&partnerID=MN8TOARS

U2 - 10.1149/1.2981618

DO - 10.1149/1.2981618

M3 - Conference Proceedings with Oral Presentation

BT - ECS Transactions

ER -