Atomic laver deposited lanthanum-(zirconate/aiuminate) based high-K dielectric stacks for future cmos-technology

Publikation: Beitrag in Buch oder Tagungsband › Vortrag mit Beitrag in Tagungsband › Begutachtung

Research Field

@inproceedings{9f6fb18952d74ab98dc707c524406593,

title = "Atomic laver deposited lanthanum-(zirconate/aiuminate) based high-K dielectric stacks for future cmos-technology",

author = "S. Abermann and C. Henkel and O. Bethge and E. Bertagnolli",

year = "2009",

doi = "10.1149/1.2981609",

language = "Undefined/Unknown",

booktitle = "ECS Transactions",

}

TY - GEN

T1 - Atomic laver deposited lanthanum-(zirconate/aiuminate) based high-K dielectric stacks for future cmos-technology

AU - Abermann, S.

AU - Henkel, C.

AU - Bethge, O.

AU - Bertagnolli, E.

PY - 2009

Y1 - 2009

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-63149125003&partnerID=MN8TOARS

U2 - 10.1149/1.2981609

DO - 10.1149/1.2981609

M3 - Vortrag mit Beitrag in Tagungsband

BT - ECS Transactions

ER -