Processing and simulation of few nm thick high-κ dielectric films

Publikation: Beitrag in Fachzeitschrift › Artikel › Begutachtung

Originalsprache	Englisch
Fachzeitschrift	Microelectronic Engineering
DOIs	https://doi.org/10.1016/j.mee.2006.01.139
Publikationsstatus	Veröffentlicht - 2006

Research Field

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title = "Processing and simulation of few nm thick high-κ dielectric films",

author = "S. Abermann and C. Jordan and M. Harasek and E. Bertagnolli",

year = "2006",

doi = "10.1016/j.mee.2006.01.139",

language = "English",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier BV",

}

TY - JOUR

T1 - Processing and simulation of few nm thick high-κ dielectric films

AU - Abermann, S.

AU - Jordan, C.

AU - Harasek, M.

AU - Bertagnolli, E.

PY - 2006

Y1 - 2006

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-33646054267&partnerID=MN8TOARS

U2 - 10.1016/j.mee.2006.01.139

DO - 10.1016/j.mee.2006.01.139

M3 - Article

SN - 0167-9317

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -