TEM study on the diffusion process of Si/NiFe Schottky barrier and Si/MgO/NiFe tunneling diode

Lee Jehyun, Josef Fidler, T. Uhrmann, Theodoros Dimopoulos, H. Brückl

Publikation: Beitrag in Buch oder Tagungsband › Beitrag in Tagungsband mit Posterpräsentation

Konferenz	MC2009
Zeitraum	30/08/09 → 4/09/09

Research Field

@inbook{bc74b5e4de564123b8633275e6d7fe2b,

title = "TEM study on the diffusion process of Si/NiFe Schottky barrier and Si/MgO/NiFe tunneling diode",

author = "Lee Jehyun and Josef Fidler and T. Uhrmann and Theodoros Dimopoulos and H. Br{\"u}ckl",

year = "2009",

language = "English",

booktitle = "MC2009",

note = "MC2009 ; Conference date: 30-08-2009 Through 04-09-2009",

}