Atomic layer deposition of high-κ/metal gate stack mosfet-devices on strained silicon-on-insulator substrates

C. Henkel, S. Abermann, O. Bethge, M. Reiche, E. Bertagnolli

Research output: Chapter in Book or Conference ProceedingsConference Proceedings with Oral Presentationpeer-review

Original languageUndefined/Unknown
Title of host publicationECS Transactions
DOIs
Publication statusPublished - 2009

Research Field

  • Energy Conversion and Hydrogen Technologies

Cite this