Skip to main navigation Skip to search Skip to main content

Impact of AL, NI, and tin metal gates on ZRO<inf>2</inf>-MOS capacitors

  • S. Abermann
  • , J. Efavi
  • , A. Lugstein
  • , E. Auer
  • , H. Gottlob
  • , M. Schmidt
  • , M. Lemme
  • , E. Bertagnolli

Research output: Chapter in Book or Conference ProceedingsConference Proceedings with Oral Presentationpeer-review

Original languageUndefined/Unknown
Title of host publicationECS Transactions
DOIs
Publication statusPublished - 2006

Research Field

  • Energy Conversion and Hydrogen Technologies

Cite this