Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition

C Ebm; E Platzgummer; H. Löschner; S Eder-Kapl; P Jöchl; M Kümmel; R Reitinger; G Hobler; A. Köck; Rainer Hainberger; Markus Wellenzohn; F Letzkus; M Irmscher

Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition

C Ebm
, E Platzgummer
, H. Löschner
, S Eder-Kapl
, P Jöchl
, M Kümmel
, R Reitinger
, G Hobler
, A. Köck
, Rainer Hainberger
, Markus Wellenzohn
, F Letzkus
, M Irmscher

Molecular Diagnostics

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	2668-2673
Number of pages	6
Journal	Journal of Vacuum Science and Technology B
Volume	27
Issue number	6
Publication status	Published - 2009

Research Field

Former Research Field - Health and Bioresources

Cite this

Ebm, C., Platzgummer, E., Löschner, H., Eder-Kapl, S., Jöchl, P., Kümmel, M., Reitinger, R., Hobler, G., Köck, A., Hainberger, R., Wellenzohn, M., Letzkus, F., & Irmscher, M. (2009). Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition. Journal of Vacuum Science and Technology B, 27(6), 2668-2673.

@article{1ae99d60b94a4cc889477727acbf32dc,

title = "Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition",

author = "C Ebm and E Platzgummer and H. L{\"o}schner and S Eder-Kapl and P J{\"o}chl and M K{\"u}mmel and R Reitinger and G Hobler and A. K{\"o}ck and Rainer Hainberger and Markus Wellenzohn and F Letzkus and M Irmscher",

year = "2009",

language = "English",

volume = "27",

pages = "2668--2673",

journal = "Journal of Vacuum Science and Technology B",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

Ebm, C, Platzgummer, E, Löschner, H, Eder-Kapl, S, Jöchl, P, Kümmel, M, Reitinger, R, Hobler, G, Köck, A, Hainberger, R, Wellenzohn, M, Letzkus, F & Irmscher, M 2009, 'Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition', Journal of Vacuum Science and Technology B, vol. 27, no. 6, pp. 2668-2673.

TY - JOUR

T1 - Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition

AU - Ebm, C

AU - Platzgummer, E

AU - Löschner, H.

AU - Eder-Kapl, S

AU - Jöchl, P

AU - Kümmel, M

AU - Reitinger, R

AU - Hobler, G

AU - Köck, A.

AU - Hainberger, Rainer

AU - Wellenzohn, Markus

AU - Letzkus, F

AU - Irmscher, M

PY - 2009

Y1 - 2009

M3 - Article

SN - 1071-1023

VL - 27

SP - 2668

EP - 2673

JO - Journal of Vacuum Science and Technology B

JF - Journal of Vacuum Science and Technology B

IS - 6

ER -