Reflective Fourier ptychography microscopy for industrial in-line application

The resolution and field of view of the images acquired by conventional imaging devices reflect a well-known trade-off. We discuss the recently developed Fourier ptychography (FP) technology. However, FP was first created for transmissive-mode microscopy and is now being researched for reflective-mode metrology. We proposed Reflective Fourier Ptychography, which is cost and executionally-effective, for high-throughput surface inspection in industrial in-line manufacturing processes. In reflective Fourier ptychography microscopy, the light is emitted from coherent light source at a specific angle, reflected from a partially diffusing object, and then detected by the image sensor. In this thesis, we investigate the role of computationally extracting the specimen’s fine details from a collection of low resolution (LR) measurements, each recorded at a different illumination angles by moving the aperture, that iteratively stitches together LR measurements in fouier and spatial domain repeatedly to builds up a wide-field, and high-resolution (HR) images.